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Capability / Materials

Materials we
already process.

Silicon, sapphire, quartz, AlN, polyimide, underfills, and thin-film metal stacks – characterized on real builds, not a datasheet. If your substrate is on this page, we have run a process on it.

/ Wafer 2in–12in / CMOS-compatible / ITAR-aware / US-soil

Laser-processed material sample at Heisler Semiconductor

The material set

Substrates and stacks on the floor.

Each material below carries known process windows for dicing, deposition, attach, and inspection. Bring a new one and we will characterize it the same way – test vehicle, DOE, metrology.

Si

Silicon, CMOS-compatible

Device and interposer-grade wafers, 2in through 12in. Thinned die handling, TSV-ready, and back-end-of-line clean – the workhorse for logic, MEMS, and sensor builds.

Sapphire

Sapphire

Hard, optically clear, and thermally stable. UV-laser diced and singulated for photonics, optical windows, and high-reliability sensor packages where a brittle substrate has to come out clean.

Quartz

Quartz / fused silica

Low-loss, low-CTE substrates for RF, timing, and optical work. Machined and metallized without chipping the edge that matters.

AlN

Aluminum nitride (AlN)

High thermal conductivity ceramic for power and RF carriers. Fluxless, maskless die attach demonstrated on 10+ RF boards at 100% yield – heat out, signal clean.

Polyimide

Polyimide & flex

Flexible dielectric for redistribution, flex circuits, and conformal sensor builds. Patterned and laser-processed where rigid substrates will not bend.

Underfills

Underfills

Capillary and no-flow underfills qualified alongside flip-chip attach to manage thermomechanical stress across >900-bump packages without voiding.

Thin-film

Thin-film metallization

PVD/CVD/ALD metal stacks for pads, seed, RDL, and bond surfaces. Adhesion and barrier layers tuned to the attach and wire-bond step that follows.

Metals & ceramics

Metals & technical ceramics

Lead frames, carriers, and ceramic substrates laser-cut, marked, and prepped for assembly – the parts that hold everything else together.

Detailed material design rules and process windows available under NDA.

Material → process

Pick the substrate. We will tell you the step.

Material choice drives the process. Here is where each one lands, with a link straight to the capability that runs it.

Silicon Wafer-level litho, TSV, deposition, etch, CMP, and RDL for interposers and fan-out.
Sapphire / quartz Laser micromachining – UV 355nm dicing, micro-vias, and singulation on brittle, transparent substrates.
AlN RF packaging – fluxless die attach on high-thermal-conductivity ceramic for RF and power carriers.
Polyimide / flex Advanced packaging – RDL, flex builds, and 3D heterogeneous integration.
Underfills + bumps Advanced packaging – flip chip C4/C2/Au-stud with capillary and no-flow underfill.
Thin-film metal Wafer-level PVD/CVD/ALD pad, seed, and barrier stacks feeding attach and wire bond.

Why material fit matters

The substrate decides whether it survives.

A wrong material pairing does not fail on the bench. It fails at thermal cycle, at the RF corner, or two years into the field. We screen for that before the build, not after.

Pick the substrate for the physics, then let the process follow. We match coefficient of expansion, conductivity, and surface chemistry to the attach and metrology steps that come next.

Thermal

CTE mismatch and heat path drive solder fatigue and warpage. AlN and matched underfills move heat out and keep the joint intact through cycling.

RF / mmWave

Dielectric loss and surface roughness cost you at high frequency. Low-loss quartz and clean AlN carriers hold the signal where it counts.

Hermeticity

Sealing surfaces and bond-line integrity decide whether moisture stays out. Material choice and metallization set the hermetic-test result.

Reliability

Adhesion, barrier layers, and clean edges survive screening and MIL-STD qualification. We validate with inspection and metrology on every build.

Proof, from real material builds

100%

Yield · 10+ RF boards on AlN · fluxless, maskless die attach

2–12in

Wafer handling range · CMOS-compatible silicon · thinned die

±2.5µm

Placement at 3σ · die to wafer, die, substrate, or PCB

Full material design rules, process windows, and build data available under NDA.

Where these materials ship

Built for the hard environments.

Aerospace and defense, medical and bio, RF and mmWave, advanced sensors – the programs where the substrate has to hold up. We process the material set those buyers actually qualify on.

Aerospace & Defense Medical & Bio RF / mmWave Advanced Sensors
Silicon interposer 3D render for advanced packaging

How we engage

Bring the substrate. We bring the data.

  • 01Tell us the material, geometry, and the step you need run
  • 02We map it to an existing process window or build a test vehicle
  • 03DOE and metrology confirm the window before production-intent
  • 04Inspection, cross-section, and test validate every build
  • 05Documented handoff – one engineering team, on US soil

No material is a mystery if you measure it.

If we have not run your exact stack, we characterize it the same way we characterize everything – with a test vehicle and real metrology, not a guess. Deeper specs are available under NDA.

Process More.

Tell us your substrate.
We will tell you the process.

Request a capability brief for material design rules, process windows, and build data under NDA. One engineering team, design review through volume.

Request a Capability Brief

/ US-soil / ITAR-aware / MIL-STD